Vacuum evaporation coating, sputtering coating, ion coating
Vacuum coating mainly includes vacuum evaporation, sputtering and ion coating
which are all used to deposit various metal and non-metallic films on the surface of plastic parts
by distillation or sputtering under vacuum condition.
Very thin surface coatings can be obtained by this way, meanwhile, it has the advantages of fast adhesion and normally it’s can be applied to the functional coatings
for the high grade product.
Vacuum evaporation is a method of heating metal to melt under high vacuum,
evaporate and form metal film on the surface of the sample after cooling.
The coating thickness is 0.8-1.2um.
Tiny concave and convex parts of the forming surface are filled to obtain
the surface like the mirror surface. Whether vacuum evaporation is
in order to obtain mirror effect or vacuum evaporation for steel grab with
low density connection, both of them must be treated with bottom painting.
Sputtering coating usually refers to the magnetron sputtering coating, which belongs
to high speed low temperature sputtering coating.
This process requires a vacuum of about 1x10-3Torr,
that is 1.3x10-3Pa vacuum filled with inert gas argon (Ar) and add high voltage DC
between the plastic substrate (anode) and the metal target (cathode).
Because the electrons which caused by glow discharge excite the inert gas
and produce ion, the ion blow out the atoms of metal target and deposit then
on the plastic surface, General metal coating is mostly DC sputtering,
while non-conductive materials use RFAC sputtering coating.
Ion plating is a method of partially ionization of gas or evaporated substance
by gas discharge under vacuum condition and deposition of evaporated substance
or its reactants on substrate under the bombardment of gas ion or evaporated substance ion.
These include magnetron sputtering ion plating, reactive ion plating,
hollow cathode discharge ion plating (hollow cathode evaporation),
multi-arc ion plating (cathode arc ion plating) and etc.