SF Series Electron Beam Evaporation Optical Vacuum Coating Machine

Date:2016-01-13 10:14:16　Hits:4974

Operational principle

Electron beam evaporation is that the membrane is put into the water-cooled copper crucible, heated by direct use of electron beam, the vaporized atoms or molecules of membrane material is condensed to a mould by incidence to the surface of the substrate after escaping from the surface evaporation. Electron beam evaporation has high thermal efficiency, beam density, evaporation speed, high purity of film made than the resistance heating evaporation.

Applications

Optical Coating Machine can coat layers more short pass, long wave pass, antireflection film, reflective film, filter membrane, beam splitter, band-pass film, dielectric film, highly reflective film, reflective film of various color film system , can achieve 0-50 layer membranes based coating, but also to meet such as automotive reflective glass, glasses, optical lens, cold cups and other products coating requirements. Configure different evaporation sources, electron gun and ion source and a film thickness meter can be coated various membrane system, metal, oxides, compounds and other high melting membrane can be deposited.

Features

1) Optical coating Machine is equipped with a quartz crystal thickness meter, adopts PLC and touch screen systems combined to achieve automatic control of the entire work process , work efficiency and product quality excellent repeatability consistency.
2) It applies to the field of optics industry , large-scale industrial production requires manufacturers to use.

technical parameter

Model	SF-800	SF-1200	SF-1400	SF-1600	SFW-1000	SFW-1200	SFW-1600
vacuum chamber dimensions	φ800X1000MM	φ1200X1400MM	φ1400X1600MM	φ1600X1800MM	φ1000X1100MM	φ1200X1400MM	φ1600X1800MM
vacuum system	KT500 Diffusion pump unit	KT630 Diffusion pump unit	A pair of KT630 Diffusion pump unit	A pair of KT630 Diffusion pump unit	KT500 Diffusion pump unit	KT630 Diffusion pump unit	A pair of KT630 Diffusion pump unit
Coating system	Electron gun evaporation source, special coating auxiliary ion power or hall ion source
Inflation system	The pressure controller	The pressure controller	The pressure controller	The pressure controller	The pressure controller	The pressure controller	The pressure controller
Control mode	Manual or automatic	Manual or automatic	Manual or automatic	Manual or automatic	Manual or automatic	Manual or automatic	Manual or automatic
Film thickness monitoring system	Quartz crystal film thickness monitoring system	Quartz crystal film thickness monitoring system	Quartz crystal film thickness monitoring system	Quartz crystal film thickness monitoring system	Quartz crystal film thickness monitoring system	Quartz crystal film thickness monitoring system	Quartz crystal film thickness monitoring system
Pumping rate	5X10-3Pa <15min	5X10-3Pa <15min	5X10-3Pa <15min	5X10-3Pa <15min	5X10-3Pa <15min	5X10-3Pa <15min	5X10-3Pa <15min
Ultimate vacuum	3.0X10-4Pa	3.0X10-4Pa	3.0X10-4Pa	3.0X10-4Pa	3.0X10-4Pa	3.0X10-4Pa	3.0X10-4Pa
Remarks	Above equipment parameters for your reference only, specific according to customers' special requirement of practical process design

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