GSF Series High-precision Electron Beam Evaporation Vacuum Coating Machine
Date:2016-01-13 10:18:51 Hits:6836
The working principle of GSF Series High-precision Electron Beam Evaporation Vacuum Coating Machine is that the membrane is put into the water-cooled copper crucible, heated by direct use of electron beam, the vaporized atoms or molecules of membrane material is condensed to a mould by incidence to the surface of the substrate after escaping from the surface evaporation. Electron beam evaporation has high thermal efficiency, beam density, evaporation speed, high purity of film made than the resistance heating evaporation.
Optical Coating machine can coat the shortwave, long wave pass, antireflection film, reflective film, filter membrane, beam splitter, band-pass film, dielectric film, highly reflective film, reflective film and various color film system with many layers, can achieve the system coating film 0-90 layer of film, but also can meet coating requirements for the products such as automotive reflective glass, binoculars, glasses, optical lens, cold cups and other products. It can configure the different evaporation sources, electron gun and ion source and a film thickness meter can be coated various membrane system, metal, oxides, compounds and other high melting membrane can be deposited.
1) High-precision optical coating machine is equipped with a quartz crystal thickness, optical thickness of the automatic control system, PLC and industrial PC systems are used with self-developed PY3100 to joint realize the entire work process automatic control, can achieve unattended, thereby increasing the efficiency and ensure consistency of product quality and stability.
2) High pumping speed vacuum system is equipped plus with cryogenic equipment, excellent dynamic vacuum capabilities to provide the necessary security vacuum conditions for complex optical film system preparation.
3) E-type electron gun with stable evaporation distribution and reliable performance is equipped for the optimal design of positional relationship between the evaporation source and work piece holder, in order to achieve precise adjustment of the membrane system of the membrane material evaporation work distribution of protection.
4) Smooth and high-speed rotation of the work piece holder rotation system is equipped so that the work piece holder inner and outer rings spectral curve tends to be more consistent product.
5) It applies to the field of optics industry, large-scale industrial production of high-end manufacturers use requirements.
Model | GSF-800 | GSF-1200 | GSF-1400 | GSF-1600 | GSFW-1000 | GSFW-1200 | GSFW-1600 |
vacuum chamber dimensions | φ800X1000MM | φ1200X1400MM | φ1400X1600MM | φ1600X1800MM | φ1000X1100MM | φ1200X1400MM | φ1600X1800MM |
vacuum system | KT400
Diffusion pump unit | KT630
Diffusion pump unit | 雙KT630
Diffusion pump unit | 雙KT630
Diffusion pump unit | KT500
Diffusion pump unit | KT630
Diffusion pump unit | 雙KT630
Diffusion
pump unit |
Coating system | Electron gun evaporation source, special coating auxiliary ion power or hall ion source |
Inflation system | The pressure controller |
Control system | Industrial computer automatic control (industrial) \ PYT2000 real-time online film monitoring system |
Control mode | Manual or automatic | Manual or automatic | Manual or automatic | Manual or automatic | Manual or automatic | Manual or automatic | Manual or automatic |
Filmthickness monitoring system | Quartz crystal film thickness monitoring system, optical film thickness monitoring system | Quartz crystal film thickness monitoring system, optical film thickness monitoring system | Quartz crystal film thickness monitoring system, optical film thickness monitoring system | Quartz crystal film thickness monitoring system, optical film thickness monitoring system | Quartz crystal film thickness monitoring system, optical film thickness monitoring system | Quartz crystal film thickness monitoring system, optical film thickness monitoring system | Quartz crystal film thickness monitoring system, optical film thickness monitoring system |
Pumping rate | 5X10-3Pa
<15min | 5X10-3Pa
<15min | 5X10-3Pa
<15min | 5X10-3Pa
<15min | 5X10-3Pa
<15min | 5X10-3Pa
<15min | 5X10-3Pa
<15min |
Ultimate vacuum | 3.0X10-4Pa | 3.0X10-4Pa | 3.0X10-4Pa | 3.0X10-4Pa | 3.0X10-4Pa | 3.0X10-4Pa | 3.0X10-4Pa |
Remarks | Above equipment parameters for your reference only, specific according to customers' special requirement of practical process design |
